JPS6314321B2 - - Google Patents
Info
- Publication number
- JPS6314321B2 JPS6314321B2 JP17441281A JP17441281A JPS6314321B2 JP S6314321 B2 JPS6314321 B2 JP S6314321B2 JP 17441281 A JP17441281 A JP 17441281A JP 17441281 A JP17441281 A JP 17441281A JP S6314321 B2 JPS6314321 B2 JP S6314321B2
- Authority
- JP
- Japan
- Prior art keywords
- silicon
- diffraction grating
- layer
- silicon wafer
- manufacturing
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims description 35
- 229910052710 silicon Inorganic materials 0.000 claims description 35
- 239000010703 silicon Substances 0.000 claims description 35
- 238000004519 manufacturing process Methods 0.000 claims description 12
- 238000000034 method Methods 0.000 claims description 10
- 238000003486 chemical etching Methods 0.000 claims description 9
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical group [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 claims description 4
- 150000001412 amines Chemical class 0.000 claims description 4
- 239000007864 aqueous solution Substances 0.000 claims description 3
- 238000000206 photolithography Methods 0.000 claims description 2
- 239000000243 solution Substances 0.000 claims description 2
- 235000012431 wafers Nutrition 0.000 description 16
- 238000005530 etching Methods 0.000 description 8
- 239000013078 crystal Substances 0.000 description 4
- 239000006185 dispersion Substances 0.000 description 4
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 3
- 229910052796 boron Inorganic materials 0.000 description 3
- 229910052814 silicon oxide Inorganic materials 0.000 description 3
- 239000000126 substance Substances 0.000 description 3
- 238000010586 diagram Methods 0.000 description 2
- 238000005468 ion implantation Methods 0.000 description 2
- 150000004767 nitrides Chemical class 0.000 description 2
- 230000003287 optical effect Effects 0.000 description 2
- 238000000059 patterning Methods 0.000 description 2
- 229920002120 photoresistant polymer Polymers 0.000 description 2
- -1 Boron ions Chemical class 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 230000007797 corrosion Effects 0.000 description 1
- 238000005260 corrosion Methods 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 238000001312 dry etching Methods 0.000 description 1
- 239000013307 optical fiber Substances 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 238000000992 sputter etching Methods 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/18—Diffraction gratings
- G02B5/1847—Manufacturing methods
- G02B5/1857—Manufacturing methods using exposure or etching means, e.g. holography, photolithography, exposure to electron or ion beams
Landscapes
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Diffracting Gratings Or Hologram Optical Elements (AREA)
- Weting (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP17441281A JPS5876804A (ja) | 1981-11-02 | 1981-11-02 | シリコン回折格子の作製法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP17441281A JPS5876804A (ja) | 1981-11-02 | 1981-11-02 | シリコン回折格子の作製法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5876804A JPS5876804A (ja) | 1983-05-10 |
| JPS6314321B2 true JPS6314321B2 (en]) | 1988-03-30 |
Family
ID=15978097
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP17441281A Granted JPS5876804A (ja) | 1981-11-02 | 1981-11-02 | シリコン回折格子の作製法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5876804A (en]) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0214628U (en]) * | 1988-07-07 | 1990-01-30 | ||
| JPH02126314U (en]) * | 1989-03-28 | 1990-10-18 |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6517734B1 (en) * | 2000-07-13 | 2003-02-11 | Network Photonics, Inc. | Grating fabrication process using combined crystalline-dependent and crystalline-independent etching |
| JP2003075622A (ja) * | 2001-09-05 | 2003-03-12 | Toshiba Corp | 回折格子、回折格子の加工方法及び光学要素 |
-
1981
- 1981-11-02 JP JP17441281A patent/JPS5876804A/ja active Granted
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0214628U (en]) * | 1988-07-07 | 1990-01-30 | ||
| JPH02126314U (en]) * | 1989-03-28 | 1990-10-18 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5876804A (ja) | 1983-05-10 |
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